Development of High Density Interconnect (HDI) Ablation and Imaging Technologies in PCB and Electronics Manufacture (ITF/150/00)

Driven by miniaturisation of electronics products, microvia and fine-line technologies are the key technologies for 21st High Density Interconnect (HDI) manufacture in PCB and Electronics industries. Microvia ablation has been attractive for its speed and throughput. However, the drawback has been the additional photoimaging process to etch the via pattern. Work is needed to develop and apply HDI ablation technique without etching via pattern (conformal mask). A set of practical processing windows are necessary, which will be developed and customized in different manufacturing sites.

HDI imaging enables fine-line pattern (under 50um) to be formed on PCB and electronics substrate. It also shows reduction in process steps versus conventional contact imaging. However, to promote and transfer this technology, productivity and quality are important factors. Study on comparison of quality between conventional contact imaging and HDI imaging will be needed. Factors affecting throughput will be studied. Investigation on the effect of energy requirement on feature size has also to be carried out.

This project helps local PCB and electronics substrate industries to establish and elevate its necessary technical competency for survival and to enhance its productivity and quality. This elevation in technology eventually increases competitive edge and also promote awareness on innovation development within these industries. In the near future, these industries shall be able to develop their own technology niches and excel in some of the major technological areas.

This project provides local PCB and electronic substrate manufacturers the much-needed technical support for high value-added PCB and substrate fabrication through the application and adoption of HDI ablation and imaging technologies. Through all its deliverables, the project will benefit the PCB and electronic substrate manufacturers in following:

Deliverable(s)

  1. To adopt the HDI ablation of microvia.
  2. To enhance the productivity of HDI ablation of microvia.
  3. To explore conformal mask alternative process. For conventional CO2 ablation, microvias are ablated with an etched opening in the copper, which is known as conformal mask process. An additional photoimaging process is required. Therefore, an alternative process called Direct HDI ablation would be a new attempt to drill directly through both copper and dielectric.
  4. To adopt HDI imaging technologies for fabricating high density circuitry with higher yields and lower costs compared with conventional imaging process.
  5. To enhance the productivity and flexibility of HDI imaging processes.
  6. To master these HDI ablation and imaging technologies which lead to successful installation of high-volume production for HDI.

Project Commencement Date:
Decemeber 1, 2000

Project Completion Date:
November 30, 2003

Principal Investigator:
Dr. Winco K.C. Yung
Tel (852) 2766-6599

Project Team Member:
1.Dr. Winco K.C. Yung
2.Prof T.M. Yue
3.Prof. W.B. Lee
4.Mr. Steven Tam
5.Mr. Robin Tsang
6. Ms. Carrie Cheung

Sponsoring Company:
1.Compass Technology Co. Ltd.
2.Oriental Printed Circuits Ltd.
3.Flextronics Int’l (Astron Group Ltd.)
4.Creo/Orbotech Pacific Ltd.
5.Mitsui Mining & Smelting Co. Ltd.